Surface Microroughness of Silicon in Wet Process and its Minimization |
| Journal |
Solid State Phenomena (Volume 134) |
| Volume |
Ultra Clean Processing of Semiconductor Surfaces VIII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
45-48 |
| DOI |
10.4028/www.scientific.net/SSP.134.45 |
| Citation |
Hitoshi Morinaga et al., 2007, Solid State Phenomena, 134, 45 |
| Online since |
November, 2007 |
| Authors |
Hitoshi Morinaga, Kenji Shimaoka, Tadahiro Ohmi |
| Keywords |
Microroughness, Photoinduced Oxidation, Photoinduced Roughness |
| Full Paper |
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