Oxidation of Si Surface Utilizing SCCO2 |
| Journal |
Solid State Phenomena (Volume 134) |
| Volume |
Ultra Clean Processing of Semiconductor Surfaces VIII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
49-52 |
| DOI |
10.4028/www.scientific.net/SSP.134.49 |
| Citation |
K. Saito et al., 2007, Solid State Phenomena, 134, 49 |
| Online since |
November, 2007 |
| Authors |
K. Saito, T. Kitajima, M. Kohno, I. Mizobata, T. Iwata, S. Hirae |
| Keywords |
CO2, C-V, Oxide, Silicon Surface, Supercritical, X-Ray Photoelectron Spectroscopy (XPS) |
| Full Paper |
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