Single-Wafer Wet Chemical Oxide Formation for Pre-ALD High-k Deposition on 300 mm Wafer |
| Journal |
Solid State Phenomena (Volume 134) |
| Volume |
Ultra Clean Processing of Semiconductor Surfaces VIII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
53-56 |
| DOI |
10.4028/www.scientific.net/SSP.134.53 |
| Online since |
November, 2007 |
| Authors |
Kenichi Sano,
Akira Izumi,
Atsuro Eitoku,
James Snow,
L. Nyns,
S. Kubicek,
R. Singanamalla,
O. Richard,
Thierry Conard,
Rita Vos,
Paul W. Mertens
|
| Keywords |
Atomic Layer Deposition ALD, High-k, Interface, Oxide, Ozone, Si<110>, Single Wafer Cleaning |
| Full Paper |
Get the full paper by clicking here
|
