Single-Wafer Wet Chemical Oxide Formation for Pre-ALD High-k Deposition on 300 mm Wafer |
| Journal |
Solid State Phenomena (Volume 134) |
| Volume |
Ultra Clean Processing of Semiconductor Surfaces VIII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
53-56 |
| DOI |
10.4028/www.scientific.net/SSP.134.53 |
| Citation |
Kenichi Sano et al., 2007, Solid State Phenomena, 134, 53 |
| Online since |
November, 2007 |
| Authors |
Kenichi Sano, Akira Izumi, Atsuro Eitoku, James Snow, L. Nyns, S. Kubicek, R. Singanamalla, O. Richard, Thierry Conard, Rita Vos, Paul W. Mertens |
| Keywords |
Atomic Layer Deposition ALD, High-k, Interface, Oxide, Ozone, Si<110>, Single Wafer Cleaning |
| Full Paper |
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