Critical Thickness Threshold in HfO2 Layers |
| Journal |
Solid State Phenomena (Volume 134) |
| Volume |
Ultra Clean Processing of Semiconductor Surfaces VIII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
67-70 |
| DOI |
10.4028/www.scientific.net/SSP.134.67 |
| Citation |
Pascal Besson et al., 2007, Solid State Phenomena, 134, 67 |
| Online since |
November, 2007 |
| Authors |
Pascal Besson, Virginie Loup, Thierry Salvetat, Névine Rochat, Sandrine Lhostis, Sylvie Favier, Karen Dabertrand, Vincent Cosnier |
| Keywords |
Crystallized, HfO2, High-k, Thickness, Threshold |
| Full Paper |
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