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Surface Preparation Challenge on Nitrided Gate Oxides

Journal Solid State Phenomena (Volume 134)
Volume Ultra Clean Processing of Semiconductor Surfaces VIII
Edited by Paul Mertens, Marc Meuris and Marc Heyns
Pages 71-74
DOI 10.4028/www.scientific.net/SSP.134.71
Citation Philippe Garnier et al., 2007, Solid State Phenomena, 134, 71
Online since November, 2007
Authors Philippe Garnier, David Barge, Jerome Bienacel, Brice Tavel, Nicolas Cabuil, Didier Lévy, Kathy Barla
Keywords Nitrided Oxide, Nitrogen Concentration Profile, Triple Gate Oxide
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