Peracetic Acid as Active Species in Mixtures for Selective Etching of SiGe/Si Layer Systems – Aspects of Chemistry and Analytics |
| Journal |
Solid State Phenomena (Volume 134) |
| Volume |
Ultra Clean Processing of Semiconductor Surfaces VIII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
79-82 |
| DOI |
10.4028/www.scientific.net/SSP.134.79 |
| Citation |
Mathias Guder et al., 2007, Solid State Phenomena, 134, 79 |
| Online since |
November, 2007 |
| Authors |
Mathias Guder, Bernd O. Kolbesen, Cécile Delattre, C. Fischer, H. Schier, Gerald Wagner |
| Keywords |
Equilibrium, Iodometric Titration, Kinetics, Peracetic Acid, Photometry, Selective Etching, Silicon-Germanium (SiGe), sSOI |
| Full Paper |
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