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Ultra Clean Processing of Semiconductor Surfaces IX

Volumes 145 - 146
doi: 10.4028/www.scientific.net/SSP.145-146
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Acknowledgements

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Preface

Direct Observation of Single Bubble Cavitation Damage for MHz Cleaning

Authors: Hiroshi Tomita, Minako Inukai, Kaori Umezawa, Li Nan Ji

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High Speed Imaging of 1 MHz Driven Microbubbles in Contact with a Rigid Wall

Authors: Aaldert Zijlstra, Tom Janssens, Kurt Wostyn, Michel Versluis, Paul W. Mertens, Detlef Lohse

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Characterization of a Cavitation Bubble Structure at 230 kHz: Bubble Population, Sonoluminescence and Cleaning Potential

Authors: Andrea Otto, Till Nowak, Robert Mettin, Frank Holsteyns, Alexander Lippert

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Impact of Megasonic Activation with Different Chemistries on Silicon Surface in Single Wafer Tool

Authors: Guillaume Briend, Pascal Besson, Thierry Salvetat, Sébastien Petitdidier

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Impacts of Ionization Potentials and Megasonic Dispersion

Authors: Cole Franklin

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The Influence of Standing Waves on Cleaning with a Megasonic Nozzle

Authors: Tom Janssens, G. Doumen, S. Halder, Kurt Wostyn, Paul W. Mertens, Joachim Straka

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