Ultra Clean Processing of Semiconductor Surfaces IX
Solid State Phenomena Volumes 145 - 146
doi:10.4028/www.scientific.net/SSP.145-146
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Acknowledgements
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401 K
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Committees and Sponsors
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35 K
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Photo
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337 K
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Preface
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32 K
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Direct Observation of Single Bubble Cavitation Damage for MHz Cleaning
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1 M
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Authors: Hiroshi Tomita, Minako Inukai, Kaori Umezawa, Li Nan Ji
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High Speed Imaging of 1 MHz Driven Microbubbles in Contact with a Rigid Wall
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453 K
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Authors: Aaldert Zijlstra, Tom Janssens, Kurt Wostyn, Michel Versluis, Paul W. Mertens, Detlef Lohse
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Characterization of a Cavitation Bubble Structure at 230 kHz: Bubble Population, Sonoluminescence and Cleaning Potential
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Authors: Andrea Otto, Till Nowak, Robert Mettin, Frank Holsteyns, Alexander Lippert
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Impact of Megasonic Activation with Different Chemistries on Silicon Surface in Single Wafer Tool
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641 K
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Authors: Guillaume Briend, Pascal Besson, Thierry Salvetat, Sébastien Petitdidier
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Impacts of Ionization Potentials and Megasonic Dispersion
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339 K
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Authors: Cole Franklin
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The Influence of Standing Waves on Cleaning with a Megasonic Nozzle
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185 K
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Authors: Tom Janssens, G. Doumen, S. Halder, Kurt Wostyn, Paul W. Mertens, Joachim Straka
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Megasonic Sweeping and Silicon Wafer Cleaning
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623 K
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Authors: J.M. Goodson, R. Nagarajan
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p31
Removal of Nano-Particles by Aerosol Spray:
Effect of Droplet Size and Velocity on Cleaning Performance
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205 K
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Authors: K. Xu, S. Pichler, Kurt Wostyn, G. Cado, C. Springer, Glenn W. Gale, Michael Dalmer, Paul W. Mertens, Twan Bearda, E. Gaulhofer, D. Podlesnik
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High Aspect Ratio Contact Clean Study in 58nm Flash Device
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1 M
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Authors: Pi Chun Yu, Cheng Kuen Chen, Jin Lang Lin, Chih Ning Wu, Hiroshi Matsuo
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High Velocity Aerosol Cleaning with Organic Solvents: Particle Removal and Substrate Damage
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965 K
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Authors: Michael T. Andreas, Kurt Wostyn, Masayuki Wada, Tom Janssens, Karine Kenis, Twan Bearda, Paul W. Mertens
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Cleaning Technique Using High-Speed Steam-Water Mixed Spray
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736 K
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Authors: Masao Watanabe, Toshiyuki Sanada, Atsushi Hayashida, Yoichi Isago