Surface Texturization and Interface Passivation of Mono-Crystalline Silicon Substrates by Wet Chemical Treatments |
| Journal |
Solid State Phenomena (Volumes 145 - 146) |
| Volume |
Ultra Clean Processing of Semiconductor Surfaces IX |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
223-226 |
| DOI |
10.4028/www.scientific.net/SSP.145-146.223 |
| Citation |
W. Sievert et al., 2009, Solid State Phenomena, 145-146, 223 |
| Online since |
January, 2009 |
| Authors |
W. Sievert, K.U. Zimmermann, B. Hartmann, C. Klimm, K. Jacob, H. Angermann |
| Keywords |
H-Termination, Light Trapping, Scanning Electron Microscope (SEM), Si Surface Texturization, Surface Photo Voltage (SPV), UV-NIR-Reflectance, Wet Chemical Etching |
| Full Paper |
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