Paper Title:
The Influence of Standing Waves on Cleaning with a Megasonic Nozzle
  Abstract

A non uniform sound field distribution can be a problem in a megasonic cleaning system, since a higher sound intensity can cause damage, while areas exposed to a lower intensity will be insufficiently cleaned. These non uniformities can be the result of sound field reflection, leading to standing waves, and the interference related to the near field. In a single wafer tool with a transducer facing the wafer a small height difference will have a large impact on the cleaning efficiency if standing waves are present. Here we study the impact of the wafer transducer height in a cleaning system using a megasonic nozzle above a rotating wafer.

  Info
Periodical
Solid State Phenomena (Volumes 145-146)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
23-26
DOI
10.4028/www.scientific.net/SSP.145-146.23
Citation
T. Janssens, G. Doumen, S. Halder, K. Wostyn, P. W. Mertens, J. Straka, "The Influence of Standing Waves on Cleaning with a Megasonic Nozzle", Solid State Phenomena, Vols. 145-146, pp. 23-26, 2009
Online since
January 2009
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Price
$32.00
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