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Megasonic Sweeping and Silicon Wafer Cleaning

Journal Solid State Phenomena (Volumes 145 - 146)
Volume Ultra Clean Processing of Semiconductor Surfaces IX
Edited by Paul Mertens, Marc Meuris and Marc Heyns
Pages 27-30
DOI 10.4028/www.scientific.net/SSP.145-146.27
Citation J.M. Goodson et al., 2009, Solid State Phenomena, 145-146, 27
Online since January, 2009
Authors J.M. Goodson, R. Nagarajan
Keywords Cleaning, Contamination Control, Megasonic, Particle Count, Sweep, Wafer Processing
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