Paper Title:
Analyzing the Collapse Force of Narrow Lines Measured by Lateral Force AFM Using an Analytical Mechanical Model
  Abstract

When a physical cleaning technology, such as megasonic and high-velocity-liquid aerosol cleaning, is considered for the removal of particles or photo resist residues, damage addition is a major concern. After detection of defects in long gate stack lines by bright field inspection (KT2800), SEM imaging shows they extend over a length in the order of 1μm (Figure 1) [1].

  Info
Periodical
Solid State Phenomena (Volumes 145-146)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
55-58
DOI
10.4028/www.scientific.net/SSP.145-146.55
Citation
K. Wostyn, T. G. Kim, P. W. Mertens, J. G. Park, "Analyzing the Collapse Force of Narrow Lines Measured by Lateral Force AFM Using an Analytical Mechanical Model", Solid State Phenomena, Vols. 145-146, pp. 55-58, 2009
Online since
January 2009
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