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Ultra Clean Processing of Semiconductor Surfaces IX

Solid State Phenomena Volumes 145 - 146

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• p123 Molybdenum Contamination in Silicon: Detection and Impact on Device Performances   [ 475 K ]
  Authors: Davide Codegoni, Maria Luisa Polignano, Daniele Caputo, Andrea Riva, Emmanuel Blot, David Coulon, Philippe Maillot, Nicolas Pic
• p127 Developing a High Volume Manufacturing Wet Clean Process to Remove BF₂ Implant Induced Molybdenum Contamination   [ 301 K ]
  Authors: Akshey Sehgal, Hsin Hsiung Huang, Jamal Ramdani, Jeffrey Klatt, Craig Printy, Scott Ruby, Todd Thibeault
• p131 Impact of Metal-Ion Contaminated Silica Particles on Gate Oxide Integrity   [ 892 K ]
  Authors: Ingrid Rink, Faisal Wali, D. Martin Knotter
• p135 Monitoring System for Airborne Molecular Contamination (AMC) in Semiconductor Manufacturing Areas and Micro-Environments   [ 121 K ]
  Authors: Michael Otto, Andreas Leibold, Lars Wulf, Matthias Hurlebaus, Lothar Pfitzner
• p139 Reduction of Airborne Molecular Contamination on 300 mm Front Opening Unified POD (FOUP) and Wafers Surface by Vacuum Technology   [ 808 K ]
  Authors: Philippe Maquin, Hisanori Kambara
• p143 Study of the Volatile Organic Contaminants Absorption and their Reversible Outgassing by FOUPs   [ 155 K ]
  Authors: Hervé Fontaine, Sylviane Cetre, Marc Veillerot, Adrien Danel
• p151 Prevention of Condensation Defects on Contact Patterns by Improving Rinse Process   [ 941 K ]
  Authors: Jung Min Oh, Jeong Nam Han, Kun Tack Lee, Chang Ki Hong, Woo Sung Han, Joo Tae Moon, Jin Goo Park
• p155 Single Wafer Ozone-Based Processing for Effective Edge Fluoropolymer Cleaning   [ 425 K ]
  Authors: John Niccoli, Matt Cogrono, Michelle Eastlack, Dave McCane, Craig Carlson, Erik Young, Dave Chapek
• p159 Cleanliness Management in Advanced Microelectronic   [ 210 K ]
  Authors: Yannick Borde, Adrien Danel, A. Roche, Hervé Fontaine, C. Brych
• p165 Surface Preparation and Passivation of III-V Substrates for Future Ultra-High Speed, Low Power Logic Applications   [ 205 K ]
  Authors: Willy Rachmady, James Blackwell, Gilbert Dewey, Mantu Hudait, Marko Radosavljevic, Robert Turkot Jr., Robert Chau
• p169 Preparation and Characterization of Self-Assembled Monolayers on Germanium Surfaces   [ 1 M ]
  Authors: Martin Lommel, Philipp Hönicke, Michael Kolbe, Matthias Müller, Falk Reinhardt, Pit Möbus, Eric Mankel, Burkhard Beckhoff, Bernd O. Kolbesen
• p173 Application of Single-Wafer Wet Cleaning Prior to Epitaxial SiGe Process   [ 214 K ]
  Authors: Kenichi Sano, Masayuki Wada, Frederik E. Leys, Roger Loo, Andriy Hikavyy, Paul W. Mertens, James Snow, Akira Izumi, Katsuhiko Miya, Atsuro Eitoku
• p177 Low Temperature Pre-Epi Treatment: Critical Parameters to Control Interface Contamination   [ 215 K ]
  Authors: Roger Loo, Andriy Hikavyy, Frederik E. Leys, Masayuki Wada, Kenichi Sano, Brecht De Vos, Antoine Pacco, Mireia Bargallo Gonzalez, Eddy Simoen, Peter Verheyen, Wendy Vanherle, Matty Caymax
• p181 Silicon Surface Preparation and Passivation by Vapor Phase of Heavy Water   [ 401 K ]
  Authors: Andrea E. Pap, Zsolt Nényei, Gábor Battistig, István Bársony
• p185 Defects of Silicon Substrates Caused by Electro-Static Discharge in Single Wafer Cleaning Process   [ 256 K ]
  Authors: Yoshiya Hagimoto, Hayato Iwamoto, Yasushi Honbe, Takuro Fukunaga, Hitoshi Abe