Paper Title:
Magnetic Field Analysis for Magnetron Sputtering Apparatus for Accurate Composition Control
  Abstract

Authors use magnetron sputtering technique for controlling the film composition by modifying the magnetic field with an external solenoid in addition to the magnetic field with a permanent magnet on back of composite target. It is necessary to understand the contribution of the solenoid quantitatively for the effective application of this technique. The magnetic field changes by the solenoid current on the target were calculated by the finite element method (FEM), and compared with the film composition. As the solenoid current increases, magnetic tunnel region on the target (correspond with the well sputtered region by the confined plasma) moves to the centre of the target. The behaviour corresponds with the actually formed film composition. The calculated results also give an information to design the composite target and the correction value for using the already eroded target.

  Info
Periodical
Solid State Phenomena (Volume 154)
Edited by
Marcin Leonowicz and Dariusz Oleszak
Pages
175-179
DOI
10.4028/www.scientific.net/SSP.154.175
Citation
Y. Sakurai, R. Nakajima, H. Nakamura, "Magnetic Field Analysis for Magnetron Sputtering Apparatus for Accurate Composition Control", Solid State Phenomena, Vol. 154, pp. 175-179, 2009
Online since
April 2009
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$32.00
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