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Gettering and Defect Engineering in Semiconductor Technology XIII

Solid State Phenomena Volumes 156 - 158

• Papers
• Abstracts

• p-2 Preface   [ 14 K ]
• p-1 Committeess   [ 14 K ]
• p1 Influence of Defects on Solar Cell Characteristics   [ 405 K ]
  Authors: Otwin Breitenstein, Jan Bauer, Pietro P. Altermatt, Klaus Ramspeck
• p11 Dislocation Engineering in Multicrystalline Silicon   [ 3 M ]
  Authors: Mariana Bertoni, Clémence Colin, Tonio Buonassisi
• p19 Grain Boundaries in Multicrystalline Si   [ 2 M ]
  Authors: Jun Chen, Bin Chen, Woong Lee, Masayuki Fukuzawa, Masayoshi Yamada, Takashi Sekiguchi
• p27 Analysis of Heterogeneous Iron Precipitation in Multicrystalline Silicon   [ 176 K ]
  Authors: Antti Haarahiltunen, Ville Vähänissi, Marko Yli-Koski, H. Talvitie, Hele Savin
• p35 Growth of Silicon Carbide Filaments in Multicrystalline Silicon for Solar Cells   [ 1 M ]
  Authors: Hans Joachim Möller, Claudia Funke, Jan Bauer, S. Köstner, H. Straube, Otwin Breitenstein
• p41 Analysis of Silicon Carbide and Silicon Nitride Precipitates in Block Cast Multicrystalline Silicon   [ 461 K ]
  Authors: M. Holla, Tzanimir Arguirov, Winfried Seifert, Martin Kittler
• p49 Investigations on the Behaviour of Carbon during Inductive Melting of Multicrystalline Silicon   [ 782 K ]
  Authors: Lutz Raabe, Jan Ehrig, Sindy Würzner, Olf Pätzold, Michael Stelter, Hans Joachim Möller
• p55 An Investigation into Fracture of Multi-Crystalline Silicon   [ 891 K ]
  Authors: B.R. Mansfield, David E.J. Armstrong, Peter R. Wilshaw, John D. Murphy
• p61 Strained Silicon Devices   [ 363 K ]
  Authors: Manfred Reiche, O. Moutanabbir, Jan Hoentschel, U.M. Gösele, Stefan Flachowsky, Manfred Horstmann
• p69 Novel Trends in SOI Technology for CMOS Applications   [ 13 M ]
  Authors: Oleg Kononchuk, Didier Landru, Christelle Veytizou
• p77 Advanced Si-based Semiconductors for Energy and Photonic Applications   [ 1 M ]
  Authors: J. Kouvetakis, Jose Menendez, John Tolle
• p85 Si Wafer Bonding: Structural Features of the Interface   [ 1 M ]
  Authors: V.I. Vdovin, N.D. Zakharov, Eckhard Pippel, P. Werner, M.G. Milvidskii, M. Ries, M. Seacrist, Robert J. Falster
• p91 Buried Insulating Layer Formation in Cz Si Wafers after Helium Implantation, Nitrogen Plasma Treatment and Annealing   [ 2 M ]
  Authors: N.V. Frantskevich, A.V. Frantskevich, A.K. Fedotov, A.V. Mazanik