Paper Title:
Properties of Fast-Diffusing Oxygen Species in Silicon Deduced from the Generation Kinetics of Thermal Donors
  Abstract

The generation of Thermal Donors in Si is a nucleation process controlled by several mobile On clusters. The rate-limiting transitions are found to be O1  O2 and O4  O5. The individual transition rates G12 and G45, and also G23 and G34 are deduced from the experimental data. From the transient variation of the generation rate G(t), the equilibrium concentration of the dimers is found, and with it the dimeric diffusivity is also defined. In samples pre-treated at high T, the G(t) dependence has a maximum, due to quenched-in fast-diffusing oxygen monomers (FDMs). The concentration and diffusivity of FDMs were determined.

  Info
Periodical
Solid State Phenomena (Volumes 156-158)
Edited by
M. Kittler and H. Richter
Pages
115-122
DOI
10.4028/www.scientific.net/SSP.156-158.115
Citation
V. V. Voronkov, G.I. Voronkova, A.V. Batunina, V.N. Golovina, R. J. Falster, M. Cornara, N.B. Tiurina , A.S. Guliaeva, "Properties of Fast-Diffusing Oxygen Species in Silicon Deduced from the Generation Kinetics of Thermal Donors", Solid State Phenomena, Vols. 156-158, pp. 115-122, 2010
Online since
October 2009
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