Paper Title:
Microdefects in Heavily Phosphorus-Doped Czochralski Silicon
  Abstract

Oxygen precipitation (OP) and annihilation of voids in heavily phosphorus (P)-doped Czochralski (Cz) silicon have been investigated. It was found that the nucleation anneal at 650°C resulted in much more pronounced OP in the subsequent high temperature anneal than that at 800 or 900 °C. This was due to that SiP precipitates could be formed in heavily P-doped Cz silicon by the 650oC anneal and they acted as the heterogeneous nuclei for OP in the following anneal at high temperatures. The rapid thermal anneal (RTA) at 1200°C was proved to be an effective means to annihilate voids. Moreover, it was found that the significant OP resulting from the two-step anneal of 650°C/8 h + 1000°C/16 h could also cause the substantial annihilation of voids in heavily P-doped Cz silicon. The mechanisms for the annihilation of voids have been tentatively discussed.

  Info
Periodical
Solid State Phenomena (Volumes 178-179)
Chapter
Chapter 6: Extended Defects
Edited by
W. Jantsch and F. Schäffler
Pages
201-204
DOI
10.4028/www.scientific.net/SSP.178-179.201
Citation
Z. H. Wang, X. Y. Ma, D. R. Yang, "Microdefects in Heavily Phosphorus-Doped Czochralski Silicon", Solid State Phenomena, Vols. 178-179, pp. 201-204, 2011
Online since
August 2011
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Price
$32.00
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