Paper Title:

Novel Texture Etch Chemistry for Transparent Conducting Oxides Used in Photovoltaic Cells

Periodical Solid State Phenomena (Volume 187)
Main Theme Ultra Clean Processing of Semiconductor Surfaces X
Edited by Paul Mertens, Marc Meuris and Marc Heyns
Pages 329-332
DOI 10.4028/www.scientific.net/SSP.187.329
Citation Steven Verhaverbeke et al., 2012, Solid State Phenomena, 187, 329
Online since April, 2012
Authors Steven Verhaverbeke, Roman Gouk, Kurtis Leschkies, Robert Visser
Keywords Texture Etch, Thin Film Photovoltaic, Transparent Conducting Oxide
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Abstract

n thin film photovoltaic silicon stacks, the sun facing contact needs to be transparent and textured. Typically transparent metal oxides are used for this purpose. When using sputtered ZnO as the transparent conducting contact typically an acid etch is used to texture etch the surface. This texturing enables light trapping in the cell and greatly enhances the photoresponse. Traditionally dilute HCl has been used for this purpose. In this paper we present the work on a novel etchant for this purpose consisting of HNO3 and Acetic Acid. This greatly enhances the texturing and hence the light trapping in the cell.