Paper Title:
Effect of Wet Cleanings on GST Surface: XPS Characterization
| Periodical | Solid State Phenomena (Volume 187) |
|---|---|
| Main Theme | Ultra Clean Processing of Semiconductor Surfaces X |
| Edited by | Paul Mertens, Marc Meuris and Marc Heyns |
| Pages | 37-40 |
| DOI | 10.4028/www.scientific.net/SSP.187.37 |
| Citation | Annamaria Votta et al., 2012, Solid State Phenomena, 187, 37 |
| Online since | April, 2012 |
| Authors | Annamaria Votta, Francesco Pipia, Enrica Ravizza, Simona Spadoni, Silvia Rossini, Lucilla Brattico, Mauro Alessandri |
| Keywords | Acids, GST, Wet Cleaning, XPS |
| Price | US$ 28,- |
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Abstract
GST is an alloy composed by Ge, Sb, Te whose importance is increasing more and more in semiconductors manufacturing due to its usage in Phase Change Memories (PCM) architecture, as a charge storage element. As a consequence its integration in PCM architectures requires a deeper understanding of the effect that commonly used wet cleanings may have on the surface of the alloy.
