Ultra Clean Processing of Semiconductor Surfaces X
| Paper Title | Page |
|---|---|
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Study on Al2O3 Film in Anhydrous HF Vapor Authors: Heini Ritala, Mikko Tuohiniemi |
45 |
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Deposition Wet-Etching Deposition (DWD) Method for Polysilicon Gate Fill-In at Flash Memory Authors: Chun Ling Chiang, C.M. Cheng, J.H. Liao, H.J. Lin, C.C. Yeh, J.Y. Hsieh, L.W. Yang, T.H. Yang, K.C. Chen, Chih Yuan Lu |
49 |
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Authors: Farid Sebaai, Anabela Veloso, Martine Claes, Katia Devriendt, Stephan Brus, Philippe Absil, Paul W. Mertens, Stefan de Gendt |
53 |
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A Hybrid Dry-Wet Approach for Removal of a Dummy Polysilicon Gate in a Replacement Metal Gate Scheme Authors: Guang Yaw Hwang, J.H. Liao, S.F. Tzou, Mark Lin, Autumn Yeh, David Lou, Eason Chen, Weien Huang, Gowri Kamarthy, Kai Dong Xu, Amulya Athayde |
57 |
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Static Charge Induced Damage during Lightly Doped Drain (LDD) by Single Wafer Cleaning Process Authors: Ted M.L. Guo, Tsung Hsun Tsai, Chin Cheng Chien, Michael Chan, Chan Lon Yang, Jun Yuan Wu |
63 |
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Surface Charging Induced Gate Oxide Degradation Authors: Chun Ling Chiang, C.M. Cheng, J.Y. Hsieh, J.H. Liao, L.W. Yang, T.H. Yang, K.C. Chen, Chih Yuan Lu |
67 |
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Authors: Shun Wu Lin, Vincent S. Chang, Matt Yeh, Eric Houyang |
71 |
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Effect of Drying Liquid on Stiction of High Aspect Ratio Structures Authors: Gyu Hyun Kim, Sung Hyuk Cho, Ji Hye Han, Young Bang Lee, Chi Hyeong Roh, Kwon Hong, Sung Ki Park |
75 |
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Authors: Yoshiya Hagimoto, Tomoki Tetsuka, Hayato Iwamoto, Hironobu Hyakutake, Hiroshi Tanaka |
79 |
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Authors: Takashi Mashiko, Toshiyuki Sanada, Hideo Horibe, Itsuo Nishiyama, Masao Watanabe, Atsushi Hayashida |
85 |