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Ultra Clean Processing of Semiconductor Surfaces X

Volume 187
doi: 10.4028/www.scientific.net/SSP.187
Paper Titles published in this Main Theme:
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Paper Title Page

Comparisons of Various Physical Cleaning

Authors: Sang Won Bae, Dae Hyuk Kang, Hyo San Lee, Kun Tack Lee, Yong Sun Koh

131

Effects of Target Compliance on a High-Speed Droplet Impact

Authors: Toshiyuki Sanada, Keita Ando, Tim Colonius

137

Order Estimation of Physical Processes in Dynamics of Steam-Water Mixed Spray Cleaning Technique

Authors: Masao Watanabe, Toshiyuki Sanada, Takashi Mashiko, Atsushi Hayashida

141

Thermomechanical Resist Removal-Cleaning System Using Cryogenic Micro-Slush Jet

Authors: Jun Ishimoto, Daisuke Tan, Hiroto Ohtake, Seiji Samukawa

145

Uniformity of Particle Removal by Aerosol Spray

Authors: Xiu Mei Xu, Antoine Pacco, Masayuki Wada, Leonardus Leunissen, Herbert Struyf, Paul W. Mertens

149

Development of a Novel Advanced Spray Technology Based on Investigation of Droplet Energy and Pattern Damage

Authors: T. Tanaka, M. Sato, M. Kobayashi, H. Shirakawa

153

Comparison of Gold Particle Removal from Fused Silica and Thermal Oxide Surfaces in Dilute Ammonium Hydroxide Solutions

Authors: Viraj Pandit, Manish Keswani, Shariq Siddiqui, Srini Raghavan

159

The Influence of the Angle of Incidence in Megasonic Cleaning

Authors: Steven Brems, Marc Hauptmann, Elisabeth Camerotto, Xiu Mei Xu, Stefan de Gendt, Marc M. Heyns, Paul W. Mertens

163

Simultaneous Removal of Particles from Front and Back Sides by a Single Wafer Backside Megasonic System

Authors: Chan Geun Park, Hong Seong Sohn

167

The Importance of Cavitation Hysteresis in Megasonic Cleaning

Authors: Elisabeth Camerotto, Stefan de Gendt, Marc Hauptmann, Denis Shamiryan, Marc M. Heyns, Paul W. Mertens, Steven Brems

171

Showing 31 to 40 of 81 Paper Titles
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