Ultra Clean Processing of Semiconductor Surfaces X

Control of Sonoluminescence in Carbon Dioxide Containing Di Water at near Neutral pH Conditions

Authors: Sangita Kumari, Manish Keswani, Satish Kumar Singh, Mark Beck, Eric Liebscher, Pierre Deymier, Srini Raghavan

Development of a Megasonic System for Cleaning Flat Panel Display

Authors: Hyun Se Kim, Yang Lae Lee, Eui Su Lim, Menachem Elimelech

Stroboscopic Schlieren Study of Bubble Formation during Megasonic Agitation

Authors: Marc Hauptmann, Steven Brems, Elisabeth Camerotto, Paul W. Mertens, Marc M. Heyns, Stefan de Gendt, Christ Glorieux, Walter Lauriks

Low-k Integration Using Metallic Hard Masks

Authors: O. Joubert, Nicolas Possémé, Thierry Chevolleau, Thibaut David, M. Darnon

Characterization of Low-k Dielectric Etch Residue on the Sidewall by Chemical Force Microscope

Authors: Tae Gon Kim, Quoc Toan Le, Samuel Suhard, Marcel Lux, Guy Vereecke, Martine Claes, Herbert Struyf, Stefan de Gendt, Paul W. Mertens, Marc M. Heyns

Optimized Wetting Behavior of Water-Based Cleaning Solutions for Plasma Etch Residue Removal by Application of Surfactants

Authors: Nicole Ahner, Sven Zimmermann, Matthias Schaller, Stefan E. Schulz

Modification of Post-Etch Residues by UV for Wet Removal

Authors: Quoc Toan Le, F. Drieskens, T. Conard, M. Lux, J.F. de Marneffe, H. Struyf, G. Vereecke

"Damage Free" Cleaning for Advanced BEOL Interconnections

Authors: Lucile Broussous, Kristell Courouble, Emmanuel Richard, Carole Pernel, Virginie Loup, Didier Lévy

A Descum Review for Cleaning Surfaces in Polymer Embedded Process Flows

Authors: G. Jamieson, C. Gerets, F.C. Duval, N.P. Pham, F. Iker, T. Funaya, Werner Boullart

Influence of Photoresist and BARC Selection on the Efficiency of a Post-Etch Wet Strip in BEOL Applications

Authors: Els Kesters, Marcel Lux, Joris Pittevils, Jonas Baeyens, Guy Vereecke, Christina Baerts, Denis Shamiryan, Herbert Struyf