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Simulation of Point-Defect Assisted Diffusion of Boron in RTA-Treated Silicon Wafers

Journal Solid State Phenomena (Volumes 19 - 20)
Volume Gettering and Defect Engineering in Semiconductor Technology
Edited by M. Kittler and H. Richter
Pages 271-276
DOI 10.4028/www.scientific.net/SSP.19-20.271
Citation H. Gdanitz et al., 1991, Solid State Phenomena, 19-20, 271
Authors H. Gdanitz, G. Ritter
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