Paper Title:
Dopant Deactivation and Electrically Active Defects Induced in Silicon by CF4 and CBrF3 Plasma Etching
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 19-20)
Edited by
M. Kittler and H. Richter
Pages
277-282
DOI
10.4028/www.scientific.net/SSP.19-20.277
Citation
Y.P. Baryshev, A.A. Orlikovsky, K.A. Valiev, M.N. Zolotukhin, "Dopant Deactivation and Electrically Active Defects Induced in Silicon by CF4 and CBrF3 Plasma Etching", Solid State Phenomena, Vols. 19-20, pp. 277-282, 1991
Online since
January 1991
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Price
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