Paper Title:
Behavior of Implanted Nitrogen in Si with the Buried Layer of SiO2 Precipitates
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 19-20)
Edited by
M. Kittler and H. Richter
Pages
405-410
DOI
10.4028/www.scientific.net/SSP.19-20.405
Citation
A.B. Danilin, K.A. Drakin, A.A. Malinin, V.N. Mordkovich, A.F. Petrov, O.I. Vyletalina, "Behavior of Implanted Nitrogen in Si with the Buried Layer of SiO2 Precipitates", Solid State Phenomena, Vols. 19-20, pp. 405-410, 1991
Online since
January 1991
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Price
$32.00
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