Paper Title:
XPS Sputter Depth Profiling Applid to the Analysis of Si/SiO2, Si/SiOxNy and Si/Si3N4
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 19-20)
Edited by
M. Kittler and H. Richter
Pages
593-598
DOI
10.4028/www.scientific.net/SSP.19-20.593
Citation
O. Benkherourou, J.P. Deville, "XPS Sputter Depth Profiling Applid to the Analysis of Si/SiO2, Si/SiOxNy and Si/Si3N4", Solid State Phenomena, Vols. 19-20, pp. 593-598, 1991
Online since
January 1991
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.