Gettering and Defect Engineering in Semiconductor Technology
Solid State Phenomena Volumes 32 - 33
doi:10.4028/www.scientific.net/SSP.32-33
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p1
ULSI Technology - a Complex Device Manufacturing Process
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244 K
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Authors: S.J. Hillenius
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p11
Semiconductor Isotope Engineering
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449 K
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Authors: Eugene E. Haller
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p21
Crystalline Silicon for Solar Cells
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193 K
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Authors: G. Martinelli
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p27
Light-Emitting Porous Silicon: A Defective Quantum Sponge Structure?
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650 K
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Authors: U.M. Gösele, V. Lehmann
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p39
Semiconducting Silicide-Silicon Heterostructures
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476 K
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Authors: J. Chevrier, J.Y. Natoli, Isabelle Berbezier, Antoine Ronda, J. Derrien
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p51
What Local-Density Calculations Can Teach about Semiconductor Surfaces, Interfaces and Defects
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244 K
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Authors: M. Methfessel, Jaroslaw Dąbrowski
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p57
Mechanisms of Transition Metal Gettering in Silicon
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739 K
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Authors: D. Gilles
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p71
Gettering in Silicon under Vacancy Generation Conditions
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215 K
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Authors: N.T. Bagraev, L.E. Klyachkin, V.L. Sukhanov
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p77
Phosphorus External Gettering Efficiency in Multicrystalline Silicon Wafers
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340 K
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Authors: Isabelle Périchaud, F. Floret, M. Stemmer, Santo Martinuzzi
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p83
Defect Engineering in Erbium-Doped Silicon Structure Technology
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220 K
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Authors: N.A. Sobolev, O.V. Alexandrov, B.N. Gresserov, G.M. Gusinskii, V.O. Naidenov, E.I. Sheck, V.I. Stepanov, Yu.V. Vyzhigin, L.F. Chepik, E.P. Troshina
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p89
PN Junction Formation by Two Steps Annealing
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122 K
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Authors: Chin Sheng Chen, Chiu Feng Lin, M.C. He, De Ren Yang, Duan Lin Que
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p93
Generation of the P-Induced Misfit Dislocations during the Diffusion in Silicon: Analytical Determination of the Criticy Conditions
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212 K
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Authors: F. Gaiseanu, R. Plugaru, M. Bazu, O. Buiu
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p99
Processes of Defect Formation and Gettering under Dry Etching of Si and GaAs and Measurements of Diffusion Length Profile
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262 K
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Authors: E.B. Yakimov, O.V. Kononchuk
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p105
On the Interaction of Transition Metals with Silicon Grain Boundaries
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311 K
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Authors: M. Stemmer, Santo Martinuzzi, Marcel Pasquinelli
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p111
Dry Cleaning of Silicon Wafers in a Low Energy Hydrogen Plasma
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302 K
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Authors: J. Ramm, E. Beck, Alex Dommann, Ignaz Eisele, D. Krüger, G. Lippert