Paper Title:
In Situ X-Ray Investigation of Relaxation Processes in Si1-xGex Layers on Silicon Substrate
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 32-33)
Edited by
H.G. Grimmeiss, M. Kittler and H. Richter
Pages
535-540
DOI
10.4028/www.scientific.net/SSP.32-33.535
Citation
P. Zaumseil, "In Situ X-Ray Investigation of Relaxation Processes in Si1-xGex Layers on Silicon Substrate", Solid State Phenomena, Vols. 32-33, pp. 535-540, 1993
Online since
December 1993
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Price
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