Paper Title:
Crystallisation Behaviour of Amorphous Thin Si Films Produced by Low Pressure Chemical Vapor Deposition
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 37-38)
Edited by
H.P. Strunk, J.H. Werner, B. Fortin and O. Bonnaud
Pages
293-298
DOI
10.4028/www.scientific.net/SSP.37-38.293
Citation
J.P. Guillemet, B. Pieraggi, B. Legros-de Mauduit, A. Claverie, "Crystallisation Behaviour of Amorphous Thin Si Films Produced by Low Pressure Chemical Vapor Deposition", Solid State Phenomena, Vols. 37-38, pp. 293-298, 1994
Online since
March 1994
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.