Paper Title:
A Comparison of Polysilicon Produced by Excimer (ArF) Laser Crystallisation and Low-Temperature (600°C) Furnace Crystallisation of Hydrogenated Amorphous Silicon (a-Si:H)
  Abstract

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Periodical
Solid State Phenomena (Volumes 37-38)
Edited by
H.P. Strunk, J.H. Werner, B. Fortin and O. Bonnaud
Pages
329-334
DOI
10.4028/www.scientific.net/SSP.37-38.329
Citation
T.E. Dyer, J.M. Marshall, W. Pickin, A.R. Hepburn, J.F. Davies, "A Comparison of Polysilicon Produced by Excimer (ArF) Laser Crystallisation and Low-Temperature (600°C) Furnace Crystallisation of Hydrogenated Amorphous Silicon (a-Si:H)", Solid State Phenomena, Vols. 37-38, pp. 329-334, 1994
Online since
March 1994
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