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Hydrogenated Amorphous Silicon

Solid State Phenomena Volumes 44 - 46

• Papers
• Abstracts

• p3 Selected Properties of Hydrogenated Amorphous Silicon and Silicon-Carbon Alloys   [ 1 M ]
  Authors: F. Alvarez, L.R. Tessler
• p25 On the Atomic Structure of Amorphous Semiconductors   [ 920 K ]
  Authors: L. Pusztai
• p41 Physics of Device Grade Amorphous Silicon   [ 2 M ]
  Authors: R.M. Mehra, P.C. Mathur, P.Craig Taylor
• p97 Very High Frequency Glow Discharge: Plasma- and Deposition Aspects   [ 1 M ]
  Authors: H. Keppner, U. Kroll, J. Meier, A. Shah
• p127 Hydrogen-Plasma Treated CVD Amorphous Silicon: Growth and Properties   [ 460 K ]
  Authors: I. Sakata, Mitsugu Yamanaka, Toshihiro Sekigawa, Yoshikazu Hayashi
• p135 Growth of Hydrogenated Amorphous Silicon in Electron Cyclotron Resonance Plasma   [ 2 M ]
  Authors: M. Zhang, Yukihiro Nakayama
• p181 Diagnostics of High-Rate a-Si:H Deposition in a Variable Frequency Plasma   [ 780 K ]
  Authors: M. Heintze
• p195 Ellipsometric Studies of a-Si:H Film Growth, Density and Microstructure   [ 1 M ]
  Authors: U.I. Schmidt, T. Haage, B. Schröder
• p227 Plasma Kinetics, Surface Phenomena and Growth Mechanism in Hydrogenated Amorphous Silicon: Transition from Amorphous to Micro- and Nano-Crystalline Si:H   [ 1 M ]
  Authors: D. Das
• p261 Luminescence of Porous and Amorphous Hydrogenated Silicon: Analogies and Differences   [ 781 K ]
  Authors: L. Pavesi
• p275 Electric Field Dependence of Photoluminescence in a-Si:H   [ 474 K ]
  Authors: T. Muschik, R. Schwarz
• p283 Visible Light Emission at Room Temperature from PECVD a-SiOx:H   [ 168 K ]
  Authors: J.F. Du, T. Wan, Bing Hong Zhou
• p289 The Lifetimes of High-Frequency Phonons in Amorphous Silicon: Evidence for Phonon Localization   [ 482 K ]
  Authors: A.J. Scholten, P.A.W.E. Verleg, J.I. Dijkhuis, A.V. Akimov, R.S. Meltzer, R. Orbach
• p299 Wide Band Gap Microcrystalline Silicon Thin Films   [ 2 M ]
  Authors: Rodrigo Martins, Isabel Ferreira, Elvira Fortunato
• p347 Reactive Ion Etching Characterization of a-Si:H and a-SiC:H Thin Films   [ 500 K ]
  Authors: S. La Monica, G. Saggio