Hydrogen-Plasma Treated CVD Amorphous Silicon: Growth and Properties |
|
| Journal | Solid State Phenomena (Volumes 44 - 46) |
|---|---|
| Volume | Hydrogenated Amorphous Silicon |
| Edited by | Hans Neber-Aeschbacher |
| Pages | 127-134 |
| DOI | 10.4028/www.scientific.net/SSP.44-46.127 |
| Authors | I. Sakata, Mitsugu Yamanaka, Toshihiro Sekigawa, Yoshikazu Hayashi |
| Keywords | a-Si:H, Chemical Vapor Deposition, Hydrogen Plasma Treatments, Light-Induced Changes |
| Full Paper | 
Get the full paper by clicking here
|