Growth of Hydrogenated Amorphous Silicon in Electron Cyclotron Resonance Plasma |
| Journal |
Solid State Phenomena (Volumes 44 - 46) |
| Volume |
Hydrogenated Amorphous Silicon |
| Edited by |
Hans Neber-Aeschbacher |
| Pages |
135-180 |
| DOI |
10.4028/www.scientific.net/SSP.44-46.135 |
| Citation |
M. Zhang et al., 1995, Solid State Phenomena, 44-46, 135 |
| Authors |
M. Zhang, Yukihiro Nakayama |
| Keywords |
Amorphous Silicon, Charged Particles, Electron Cyclotron Resonance Plasma, Film Growth, Plasma Chemical Vapor Deposition, Radical |
| Full Paper |
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