Diagnostics of High-Rate a-Si:H Deposition in a Variable Frequency Plasma |
|
| Journal | Solid State Phenomena (Volumes 44 - 46) |
|---|---|
| Volume | Hydrogenated Amorphous Silicon |
| Edited by | Hans Neber-Aeschbacher |
| Pages | 181-194 |
| DOI | 10.4028/www.scientific.net/SSP.44-46.181 |
| Citation | M. Heintze, 1995, Solid State Phenomena, 44-46, 181 |
| Authors | M. Heintze |
| Keywords | Electron Density, Excitation Frequency, Growth Rate, Ion Flux, VHF Plasma Deposition |
| Full Paper | 
Get the full paper by clicking here
|
First page example
