Paper Title:
Reactive Ion Etching Characterization of a-Si:H and a-SiC:H Thin Films
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 44-46)
Edited by
Hans Neber-Aeschbacher
Pages
347-354
DOI
10.4028/www.scientific.net/SSP.44-46.347
Citation
S. La Monica, G. Saggio, "Reactive Ion Etching Characterization of a-Si:H and a-SiC:H Thin Films", Solid State Phenomena, Vols. 44-46, pp. 347-354, 1995
Online since
July 1995
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