Reactive Ion Etching Characterization of a-Si:H and a-SiC:H Thin Films |
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| Journal | Solid State Phenomena (Volumes 44 - 46) |
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| Volume | Hydrogenated Amorphous Silicon |
| Edited by | Hans Neber-Aeschbacher |
| Pages | 347-354 |
| DOI | 10.4028/www.scientific.net/SSP.44-46.347 |
| Citation | S. La Monica et al., 1995, Solid State Phenomena, 44-46, 347 |
| Authors | S. La Monica, G. Saggio |
| Keywords | Amorphous Semiconductor, Dry Etching |
| Full Paper | 
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