Very High Frequency Glow Discharge: Plasma- and Deposition Aspects |
| Journal |
Solid State Phenomena (Volumes 44 - 46) |
| Volume |
Hydrogenated Amorphous Silicon |
| Edited by |
Hans Neber-Aeschbacher |
| Pages |
97-126 |
| DOI |
10.4028/www.scientific.net/SSP.44-46.97 |
| Citation |
H. Keppner et al., 1995, Solid State Phenomena, 44-46, 97 |
| Authors |
H. Keppner, U. Kroll, J. Meier, A. Shah |
| Keywords |
Glow-Discharge GD, Plasma Deposition, Plasma Enhanced Chemical Vapour Deposition, Plasma Impedance, Sheath, VHF-Glow Discharge |
| Full Paper |
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