Hydrogenated Amorphous Silicon Thin Film Transistors with a Single Layered SiO2 Gate Insulator |
| Journal |
Solid State Phenomena (Volumes 44 - 46) |
| Volume |
Hydrogenated Amorphous Silicon |
| Edited by |
Hans Neber-Aeschbacher |
| Pages |
973-982 |
| DOI |
10.4028/www.scientific.net/SSP.44-46.973 |
| Citation |
Sun Kyu Kim et al., 1995, Solid State Phenomena, 44-46, 973 |
| Authors |
Sun Kyu Kim, Kwang Seok Lee, J.H. Kim, C.H. Hong, Jin Jang |
| Keywords |
Hydrogenated Amorphous Silicon, Plasma Treatment, SiO2, TFT |
| Full Paper |
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