Paper Title:
DRAM Wafer Qualification Issues: Oxide Integrity vs. D-Defects, Oxygen Precipitates and High Temperature Annealing
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 47-48)
Edited by
H. Richter, M. Kittler and C. Claeys
Pages
327-352
DOI
10.4028/www.scientific.net/SSP.47-48.327
Citation
J.G. Park, G. A. Rozgonyi, "DRAM Wafer Qualification Issues: Oxide Integrity vs. D-Defects, Oxygen Precipitates and High Temperature Annealing", Solid State Phenomena, Vols. 47-48, pp. 327-352, 1996
Online since
July 1995
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Price
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