Paper Title:
The Relaxation and Diffusion Behaviour of Strained Si1-xGex Layers on Si Substrates at High Temperature under Hydrostatic Pressure
  Abstract

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Periodical
Solid State Phenomena (Volumes 47-48)
Edited by
H. Richter, M. Kittler and C. Claeys
Pages
517-522
DOI
10.4028/www.scientific.net/SSP.47-48.517
Citation
P. Zaumseil, G.G. Fischer, C. Quick, A. Misiuk, "The Relaxation and Diffusion Behaviour of Strained Si1-xGex Layers on Si Substrates at High Temperature under Hydrostatic Pressure", Solid State Phenomena, Vols. 47-48, pp. 517-522, 1996
Online since
July 1995
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