Paper Title:
Characterization of Low Pressure Chemical Vapor Deposited Polysilicon Using Ellipsometry
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 51-52)
Edited by
S. Pizzini, H.P. Strunk and J.H. Werner
Pages
179-186
DOI
10.4028/www.scientific.net/SSP.51-52.179
Citation
L. Asinovsky, S. Fox, E. Karagiannis, M. Schroth, J.J. Sweeney, "Characterization of Low Pressure Chemical Vapor Deposited Polysilicon Using Ellipsometry", Solid State Phenomena, Vols. 51-52, pp. 179-186, 1996
Online since
May 1996
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Price
$32.00
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