Paper Title:
Growth of Polycrystalline Silicon Films at High Deposition Rate and Low Temperature by Hot Wire Chemical Vapour Deposition
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 51-52)
Edited by
S. Pizzini, H.P. Strunk and J.H. Werner
Pages
255-260
DOI
10.4028/www.scientific.net/SSP.51-52.255
Citation
A.R. Middya, J. Guillet, J.E. Bouree, J. Perrin, "Growth of Polycrystalline Silicon Films at High Deposition Rate and Low Temperature by Hot Wire Chemical Vapour Deposition", Solid State Phenomena, Vols. 51-52, pp. 255-260, 1996
Online since
May 1996
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