Paper Title:
Electron Beam Induced Current Imaging of Silicon Oxide Damage Due to Reactive Ion Etching
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 51-52)
Edited by
S. Pizzini, H.P. Strunk and J.H. Werner
Pages
359-366
DOI
10.4028/www.scientific.net/SSP.51-52.359
Citation
H. Kirk, Z. J. Radzimski, A. Romanowski, G. A. Rozgonyi, "Electron Beam Induced Current Imaging of Silicon Oxide Damage Due to Reactive Ion Etching", Solid State Phenomena, Vols. 51-52, pp. 359-366, 1996
Online since
May 1996
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Price
$32.00
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