Paper Title:
Thin Polycrystalline Silicon Films Annealed at 950°C: Structural and Electrical Properties and Application to Thin Film Transistors
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 51-52)
Edited by
S. Pizzini, H.P. Strunk and J.H. Werner
Pages
603-608
DOI
10.4028/www.scientific.net/SSP.51-52.603
Citation
A.C. Salaün, B. Fortin, T. Mohammed-Brahim, K. Kis-Sion, L. Haji, O. Bonnaud, "Thin Polycrystalline Silicon Films Annealed at 950°C: Structural and Electrical Properties and Application to Thin Film Transistors", Solid State Phenomena, Vols. 51-52, pp. 603-608, 1996
Online since
May 1996
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Price
$32.00
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