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Oxygen Precipitation in Silicon: Correlation of the Experimental Results Obtained with IR Spectroscopy, Preferential Etching and X-Ray Topography

Journal Solid State Phenomena (Volumes 6 - 7)
Volume Gettering and Defect Engineering in Semiconductor Technology
Edited by M. Kittler
Pages 119-126
DOI 10.4028/www.scientific.net/SSP.6-7.119
Citation Erzsébet Hild et al., 1989, Solid State Phenomena, 6-7, 119
Authors Erzsébet Hild, J. Seres, E.K. Pal, S. Nouredin, T. Kormàny
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