The Rinsing Problem: Effect of Solute-Surface Interactions on Wafer Purity |
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| Journal | Solid State Phenomena (Volumes 65 - 66) |
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| Volume | Ultra Clean Processing of Silicon Surfaces IV |
| Edited by | Marc Heyns, Marc Meuris and Paul Mertens |
| Pages | 1-6 |
| DOI | 10.4028/www.scientific.net/SSP.65-66.1 |
| Citation | Lee M. Loewenstein et al., 1998, Solid State Phenomena, 65-66, 1 |
| Authors | Lee M. Loewenstein, Paul W. Mertens |
| Keywords | DI Water, Langmuir Model, Metal Ion Adsorption, Rinsing |
| Full Paper | 
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