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The Rinsing Problem: Effect of Solute-Surface Interactions on Wafer Purity

Journal Solid State Phenomena (Volumes 65 - 66)
Volume Ultra Clean Processing of Silicon Surfaces
Edited by Marc Heyns, Marc Meuris and Paul Mertens
Pages 1-6
DOI 10.4028/www.scientific.net/SSP.65-66.1
Authors Lee M. Loewenstein, Paul W. Mertens
Keywords DI Water, Langmuir Model, Metal Ion Adsorption, Rinsing
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