Behaviour of Metallic Contaminants during Mos Processing |
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| Journal | Solid State Phenomena (Volumes 65 - 66) |
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| Volume | Ultra Clean Processing of Silicon Surfaces |
| Edited by | Marc Heyns, Marc Meuris and Paul Mertens |
| Pages | 11-14 |
| DOI | 10.4028/www.scientific.net/SSP.65-66.11 |
| Authors | Twan Bearda, Stefan De Gendt, Lee M. Loewenstein, M. Knotter, Paul W. Mertens, Marc M. Heyns |
| Keywords | Contamination, Diffusion, GOI, Solubility, TXRF, Ultra-Clean Processing |
| Full Paper | 
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