Behaviour of Metallic Contaminants during Mos Processing |
| Journal |
Solid State Phenomena (Volumes 65 - 66) |
| Volume |
Ultra Clean Processing of Silicon Surfaces IV |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
11-14 |
| DOI |
10.4028/www.scientific.net/SSP.65-66.11 |
| Citation |
Twan Bearda et al., 1998, Solid State Phenomena, 65-66, 11 |
| Authors |
Twan Bearda, Stefan De Gendt, Lee M. Loewenstein, M. Knotter, Paul W. Mertens, Marc M. Heyns |
| Keywords |
Contamination, Diffusion, GOI, Solubility, TXRF, Ultra-Clean Processing |
| Full Paper |
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