Post Polysilicon Etch (Incorporating DUV Resist an BARC) Polymer Cleaning |
| Journal |
Solid State Phenomena (Volumes 65 - 66) |
| Volume |
Ultra Clean Processing of Silicon Surfaces IV |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
113-116 |
| DOI |
10.4028/www.scientific.net/SSP.65-66.113 |
| Citation |
Simon Y.M. Chooi et al., 1998, Solid State Phenomena, 65-66, 113 |
| Authors |
Simon Y.M. Chooi, Ping-Yu Ee, B.-M. Seah, Mei Sheng Zhou |
| Keywords |
Bottom Antireflective Coating (BARC), Polysilicon Etching, SC-1, Sulphuric-Peroxide Mixture (SPM) |
| Full Paper |
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