Characterization of Emitter Interface Oxide Growth in a Vertical LPCVD Polysilicon Deposition Reactor |
| Journal |
Solid State Phenomena (Volumes 65 - 66) |
| Volume |
Ultra Clean Processing of Silicon Surfaces IV |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
123-126 |
| DOI |
10.4028/www.scientific.net/SSP.65-66.123 |
| Citation |
M. Ramin et al., 1998, Solid State Phenomena, 65-66, 123 |
| Authors |
M. Ramin, C. Hechtl, A. Haeusler |
| Keywords |
Emitter, HFE, Thermal Oxide, Ultra Thin |
| Full Paper |
Get the full paper by clicking here
|
