Paper Title:
XPS Study of the Cleaning Efficiency by Ozone Processes of the Protective Films Formed by Reactive Ion Etching of Co and Ti Silicide
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 65-66)
Edited by
Marc Heyns, Marc Meuris and Paul Mertens
Pages
139-142
DOI
10.4028/www.scientific.net/SSP.65-66.139
Citation
T. Conard, S. De Gendt, M. R. Baklanov, R. Vos, M. M. Heyns, W. Vandervorst, "XPS Study of the Cleaning Efficiency by Ozone Processes of the Protective Films Formed by Reactive Ion Etching of Co and Ti Silicide", Solid State Phenomena, Vols. 65-66, pp. 139-142, 1999
Online since
November 1998
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.