Paper Title:
Angle Resolved XPS Characterization of the Formation of Cl and Br Bonds in Poly-Silicon Etching and Its Cleaning
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 65-66)
Edited by
Marc Heyns, Marc Meuris and Paul Mertens
Pages
153-156
DOI
10.4028/www.scientific.net/SSP.65-66.153
Citation
Y.B. Kim, B. Beckx, S. Vanhaelemeersch, W. Vandervorst, "Angle Resolved XPS Characterization of the Formation of Cl and Br Bonds in Poly-Silicon Etching and Its Cleaning", Solid State Phenomena, Vols. 65-66, pp. 153-156, 1999
Online since
November 1998
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Price
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