Paper Title:
Dynamics of Mass Transfer on a Wafer Surface in Ozonated-Water Processing for Photoresist Removal
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 65-66)
Edited by
Marc Heyns, Marc Meuris and Paul Mertens
Pages
157-160
DOI
10.4028/www.scientific.net/SSP.65-66.157
Citation
N. Narayanswami, S. Nelson, "Dynamics of Mass Transfer on a Wafer Surface in Ozonated-Water Processing for Photoresist Removal", Solid State Phenomena, Vols. 65-66, pp. 157-160, 1999
Online since
November 1998
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Price
$32.00
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